Plasma processing apparatus and plasma processing method
AssigneeTohoku University
InventorMasaki Hirayama
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Abstract
There is provided a plasma processing apparatus which can improve density uniformity of plasma excited by a high frequency wave as in the VHF frequency band for a substrate having a large size. The plasma processing apparatus includes a waveguide member defining a waveguide, a coaxial tube supplying electromagnetic energy from a predetermined power supply position in the longitudinal direction of the waveguide into the waveguide, first and second electrodes for electric field formation disposed so as to face a plasma formation space, and a coil member disposed in the waveguide so as to generate a voltage by electromagnetic induction due to a magnetic field and also electrically connected to the first and second electrodes.
Claims11
A plasma processing apparatus, comprising:
- a waveguide member configured to define a waveguide;
- a transmission path configured to supply electromagnetic energy from a predetermined power supply position in a longitudinal direction of the waveguide into the waveguide;
- first and second electrodes for electric field formation disposed so as to face a plasma formation space;
- and
- at least one coil member disposed in the waveguide so as to generate a voltage by electromagnetic induction due to a magnetic field, one end of the at least one coil member being electrically connected to the first electrode and the other end of the at least one coil member being electrically connected to the second electrode.
(canceled)
Dependencies are inferred from the claim text.