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US 2014/0349889 A1Published application
Formation of a supra-monolayer nanopattern and its uses
AssigneeWayne State University
InventorsGuangzhao Mao, Daniel J. Sobczynski, Sunxi Wang, Juxhin Xhahysa, Pedram Jahanian
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Abstract
The present disclosure discloses a method to prepare a supra-monolayer nanopattern and its uses.
Claims20
A method, comprising:
- disposing a plurality of microparticles onto a silicon substrate;
- chemical vapor depositing a silane to the silicon substrate with the plurality of microparticles;
- and
- allowing the silane to undergo both a bulk crosslinking reaction and a crosslinking reaction on the surface of the silicon substrate to form a nanopattern, the nanopattern comprising the plurality of microparticles and the crosslinked silane between the plurality of microparticles,
- wherein the height of the crosslinked silane is greater than the height of a monolayer of the silane.
2 more elements
A device, comprising:
- a silicon substrate;
- and
- a plurality of crosslinked silane features disposed on the silicon substrate and interfacial areas on the silicon substrate between the crosslinked silane features, the interfacial areas being part of the surface of the silicon substrate,
- wherein the individual interfacial areas are surrounded by respective individual crosslinked silane features, and
- wherein the height of the crosslinked silane is in the nanometer range and greater than the height of a monolayer of the silane.
2 more elements
Dependencies are inferred from the claim text.