Processing for electromechanical systems and equipment for same

An apparatus for processing electromechanical systems devices, comprising:

• a process chamber configured to process multiple substrates, comprising a means for isolating the process chamber into a plurality of stacked individual subchambers, each subchamber configured to process one substrate;
• a means for selectively providing a common reactant to each of the subchambers;
• and
• a common means for selectively exhausting each of the subchambers.

A method of processing substrates, comprising:

• transferring multiple substrates into a process chamber, wherein the process chamber comprises a plurality of stacked individual subchambers, each subchamber configured to process one substrate;
• exposing the substrates to a reactant provided from a reactant source commonly connected to each of the subchambers;
• and
• exhausting the reactant from the subchambers through an exhaust commonly and selectively connected to each of the subchambers.

A method of processing substrates, comprising:

• transferring multiple substrates into a process chamber, wherein the process chamber comprises a plurality of stacked individual subchambers, each subchamber configured to process one substrate;
• closing an outlet valve connected upstream of a first subchamber and downstream of a buffer;
• opening an inlet valve positioned upstream of the buffer;
• flowing reactant from a reactant source through the inlet valve and into the buffer;
• closing the inlet valve after pressure within the buffer reaches a pressure threshold;
• opening the outlet valve while the inlet valve is closed, to flow a pressure-controlled dose of reactant from the buffer into the first subchamber.