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US 2014/0349440 A1Published application
Planarization method
AssigneeCanon Kabushiki Kaisha
InventorAtsushi Kanome
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Abstract
A method of planarizing a member is provided. The method includes forming the member and polishing a top face of the member. The forming the member includes forming a resist layer which varies in thickness and performing an etch-back process. The etch-back process removes the resist layer and adjusts amounts to be removed by the polishing from respective locations of the member.
Claims15
A method of planarizing a member, comprising:
- forming the member;
- and
- polishing a top face of the member,
- wherein the forming the member includes:
- forming a resist layer which varies in thickness;
- and
- performing an etch-back process,
- wherein the etch-back process removes the resist layer and adjusts amounts to be removed by the polishing from respective locations of the member.
5 more elements
Dependencies are inferred from the claim text.