Deposition apparatus, method thereof and method for forming quantum-dot layer using the same
AssigneeSamsung Display Co., Ltd.
InventorDONG-CHAN KIM
Life of this patent
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AssigneeSamsung Display Co., Ltd.
InventorDONG-CHAN KIM
Estimating the term…
A deposition apparatus includes a first nozzle configured to spray a first deposition material toward a substrate and a second nozzle configured to spray a second deposition material, a first deposition source configured to supply the first deposition material to the first nozzle and a second deposition source configured to supply the second deposition material to the second nozzle. The deposition apparatus further includes a barrier member disposed between the first nozzle and the second nozzle and is configured to block the first deposition material evaporated through the first nozzle from being mixed with the second deposition material evaporated through the second nozzle and a vacuum chamber configured to surround the first and second nozzles, the first and second deposition sources and the barrier member.
A deposition apparatus comprising:
A method for deposition, the method comprising:
A method for forming a quantum dot layer, the method comprising:
A method for forming a display device, comprising:
Dependencies are inferred from the claim text.