Actinic-ray- or radiation-sensitive resin composition, actinic-ray-or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, semiconductor device and compound

An actinic-ray- or radiation-sensitive resin composition comprising a compound that when exposed to actinic rays or radiation, generates any of acids of general formula (I) below,

• in which
• L1 represents a single bond, —O—, —S—, —C(═O)—, —C(═O)O—, —OC(═O)—, —S(═O)—, —S(═O)2—, an optionally substituted methylene group or an optionally substituted ethylene group;
• Ar1 represents an aryl group;
• R1 represents a monovalent substituent, provided that at least one R1 represents a group having two or more carbon atoms, and that when n is 2 or greater, two or more R's may be identical to or different from each other and may be connected to each other to thereby form a ring;
• m is an integer of 1 to 4;
• and
• n is an integer of 1 to 5.