Photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device

A photosensitive resin composition comprising:

• (A-2) a resin mixture including a resin containing a structure represented by following formula (7) and a resin containing a structure represented by following formula (8), and
• (B) a photoacid generator,
• wherein the weight ratio of said resin containing a structure represented by formula (7):
• said resin containing a structure represented by formula (8) is from 5:95 to 95:5:
• {in formulae (7) and (8), each X is independently a monovalent group selected from the group consisting of a hydrogen atom, an alkoxycarbonyl group having a carbon number of 2 to 20, an alkoxycarbonylmethyl group having a carbon number of 2 to 20, an alkoxyalkyl group having a carbon number of 2 to 20, a silyl group substituted with at least one alkyl group having a carbon number of 1 to 10, a tetrahydropyranyl group, and a tetrahydrofuranyl group;
• each m1 is independently an integer of 1 to 3, provided that the plurality of m1 are not 1 at the same time, each m2 is independently an integer of 0 to 2, and 2≦(m1+m2)≦4;
• each of m3 and m4 is independently an integer of 0 to 4;
• each of n1 and n2 is independently an integer of 1 to 500;
• each R1 is independently a monovalent group selected from the group consisting of a hydrocarbon group having a carbon number of 1 to 10, an alkoxy group having a carbon number of 1 to 10, a nitro group, a cyano group, and a group represented by following formula (5) or (6);
• when m2 is 2, the plurality of R1 may be the same as or different from each other;
• each of R2 to R5 is independently a hydrogen atom, a monovalent aliphatic group having a carbon number of 1 to 10, or a monovalent aliphatic group having a carbon number of 1 to 10, in which some hydrogen atoms or all hydrogen atoms are substituted with a fluorine atom;
• each of R6 and R7 is independently a halogen atom, a hydroxyl group or a monovalent organic group;
• when m3 is an integer of 2 to 4, the plurality of R6 may be the same as or different from each other;
• when m4 is an integer of 2 to 4, the plurality of R7 may be the same as or different from each other;
• Y is a divalent organic group represented by following formula (3) or (4);
• W is a divalent group selected from the group consisting of a single bond, a chain aliphatic group having a carbon number of 1 to 10, a chain aliphatic group having a carbon number of 1 to 10, in which some hydrogen atoms or all hydrogen atoms are substituted with a fluorine atom, an alicyclic group having a carbon number of 3 to 20, an alicyclic group having a carbon number of 3 to 20, in which some hydrogen atoms or all hydrogen atoms are substituted with a fluorine atom, an alkylene oxide group having from 1 to 20 repeating units, and groups represented by following formula (2):
• (in formula (3), each of R8 and R9 is independently a hydrogen atom, a monovalent organic group having a carbon number of 1 to 11, or a group containing a carboxyl group, a sulfonic acid group or a phenolic hydroxyl group);
• {in formula (4), each of R11 to R14 is independently a hydrogen atom, a monovalent aliphatic group having a carbon number of 1 to 10, or a monovalent aliphatic group having a carbon number of 1 to 10, in which some hydrogen atoms or all hydrogen atoms are substituted with a fluorine atom;
• m5 is an integer of 1 to 4;
• when m5 is 1, R10 is a hydroxyl group;
• when n5 is an integer of 2 to 4, at least one R10 is a hydroxyl group and the remaining R10 are a halogen atom, a hydroxyl group, or a monovalent organic group;
• and all R10 may be the same or different};
• {in formula (5), R15 is a monovalent group selected from the group consisting of a hydroxyl group, an aliphatic group having a carbon number of 1 to 12, an alicyclic group having a carbon number of 3 to 12, an aromatic group having a carbon number of 6 to 18, —NH2, and groups represented by —NH—R19, —N(R19)2 and —O—R19 (wherein R19 is a monovalent group selected from an aliphatic group having a carbon number of 1 to 12, an alicyclic group having a carbon number of 3 to 12, and an aromatic group having a carbon number of 6 to 18)};
• {in formula (6), each of R16 and R17′ is independently a monovalent group selected from the group consisting of a hydrogen atom, an aliphatic group having a carbon number of 1 to 12, an alicyclic group having a carbon number of 3 to 12, and an aromatic group having a carbon number of 6 to 18, and R16 and R17′ may form a ring}.

A phenolic resin containing a structure represented by following formula (17):

• {in formula (17), each of R1 and R17 is independently a monovalent group having a carbon number of 1 to 10 selected from a hydrocarbon group and an alkoxy group;
• m1 is an integer of 2 or 3, each of m2 and m6 is independently an integer of 0 to 2, and 2≦m1+m2≦4;
• each of n1 and n2 is independently an integer of 1 to 500 and satisfies 0.05≦n1/(n1+n2)≦1;
• when m2 is 2, the plurality of R1 may be the same or different;
• and the polymer structure may be a random structure or a block structure}.

A phenolic resin containing a structure represented by following formula (18):

• {in formula (18), each R1 is independently a monovalent group having a carbon number of 1 to 10 selected from a hydrocarbon group and an alkoxy group;
• m1 is an integer of 2 or 3, m2 is an integer of 0 to 2, each of n1 and n2 is independently an integer of 1 to 500, and these members satisfy 2≦m1+m2≦4 and 0.35≦n1/(n1+n2)≦0.95;
• when m2 is 2, the plurality of R1 may be the same or different;
• and the polymer structure may be a random structure or a block structure}.

A photosensitive resin composition comprising (A-1) a resin containing a structure represented by following formula (19) and (B) a photoacid generator:

• {in formula (19), each X is independently a monovalent group selected from the group consisting of a hydrogen atom, an alkoxycarbonyl group having a carbon number of 2 to 20, an alkoxycarbonylmethyl group having a carbon number of 2 to 20, an alkoxyalkyl group having a carbon number of 2 to 20, a silyl group substituted with at least one alkyl group having a carbon number of 1 to 10, a tetrahydropyranyl group, and a tetrahydrofuranyl group;
• each m1 is independently an integer of 1 to 3, each m2 is independently an integer of 1 to 2, and 2≦(m1+m2)≦4;
• each of n1 and n2 is independently an integer of 1 to 500, and n1/(n1+n2) is from 0.05 to 1;
• each R1 is independently a monovalent group selected from the group consisting of a nitro group, a cyano group, and a group represented by following formula (5) or (6);
• when m2 is 2, the plurality of R1 may be the same as or different from each other;
• m7 is an integer of 0 to 2;
• R18 is a hydroxyl group or a methyl group;
• when m7 is 2, the plurality of R18 may be the same as or different from each other;
• z is an integer of 0 or 1;
• Y is a methylene group or a structure represented by following formula (16);
• and the polymer structure may be a random structure or a block structure};
• {in formula (5), R15 is a monovalent group selected from the group consisting of a hydroxyl group, an aliphatic group having a carbon number of 1 to 12, an alicyclic group having a carbon number of 3 to 12, an aromatic group having a carbon number of 6 to 18, —NH2, and groups represented by —NH—R19, —N(R19)2 and —O—R19 (wherein R19 is a monovalent group selected from an aliphatic group having a carbon number of 1 to 12, an alicylcic group having a carbon number of 3 to 12, and an aromatic group having a carbon number of 6 to 18)};
• {in formula (6), each of R16 and R17′ is independently a monovalent group selected from a hydrogen atom, an aliphatic group having a carbon number of 1 to 12, an alicyclic group having a carbon number of 3 to 12, and an aromatic group having a carbon number of 6 to 18, and R16 and R17′ may form a ring};