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US 2014/0349218 A1Published application
Photosensitive material, holographic recording medium and holographic recording method
AssigneeNippon Steel & Sumikin Chemical Co., Ltd.
InventorsTakehiro Shimizu, Toshio Ando, Kazuyoshi Masaki
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Abstract
A photosensitive material includes: a polymer matrix, a radical polymerization monomer and photo-radical polymerization initiator, wherein the polymer matrix has stable nitroxy radical at side chain thereof, wherein a molar ratio of the stable nitroxy radical to the radical polymerization monomer is set within a range of 0.03 to 0.25.
Claims13
A photosensitive material, comprising:
- a polymer matrix, a radical polymerization monomer and photo-radical polymerization initiator,
- wherein the polymer matrix has stable nitroxy radical at side chain thereof,
- wherein a molar ratio of the stable nitroxy radical to the radical polymerization monomer is set within a range of 0.03 to 0.25.
Dependencies are inferred from the claim text.