Surface-tensioned sapphire plate
AssigneeApple Inc.
InventorsRudolf Beckmann, Markus Kress
Life of this patent
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Abstract
A surface-tensioned sapphire plate and a corresponding manufacturing process. The plate may include a planar sapphire substrate and at least one layer disposed on the surface of the substrate for tensing the substrate. The layer may include at least 50 wt.-% of aluminum oxide (Al2O3). The manufacturing process for producing of a sapphire plate may include providing a planar sapphire substrate, and coating at least one surface of the substrate with a layer tensing the substrate. The layer may include at least 50 wt.-% of aluminum oxide (Al2O3).
Claims20
A surface-tensioned sapphire plate comprising:
- a planar sapphire substrate;
- and
- at least one layer disposed on the surface of the substrate tensing the substrate, wherein the layer has at least 50 wt.-% of aluminum oxide (Al2O3).
A method for producing of a sapphire plate comprising:
- providing a planar sapphire substrate;
- and
- coating at least one surface of the substrate with a layer tensing the substrate,
- wherein the layer comprises at least 50 wt.-% of aluminum oxide (Al2O3).
The method of claim 17, wherein trimethylaluminum (TMA) and nitrous oxy-gen are used as reaction gases for the plasma-assisted CVD process in a ratio of one of:
- 1/2, 1/4, 1/8, 1/16, 1/24 or 1/32.
Dependencies are inferred from the claim text.