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US 2014/0349086 A1Published application
Photo-curable composition and patterning method using the same
AssigneeCanon Kabushiki Kaisha
InventorsToshiki Ito, Chieko Mihara, Kanae Kawahata, Motoki Okinaka
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Abstract
The present invention provides a photo-curable composition that requires a small demolding force. The present invention also provides a UV imprint method that requires a small demolding force. The photo-curable composition contains a polymerizable monomer (A), a polymerization initiator (B), and a fluorine-containing surfactant (C). A photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.
Claims14
A photo-curable composition, comprising:
- a polymerizable monomer (A);
- a polymerization initiator (B);
- and
- a fluorine-containing surfactant (C),
- wherein a photo-cured product of the photo-curable composition has a water contact angle of 74 degrees or less.
2 more elements
A photo-curable composition for nanoimpirnts, comprising:
- a polymerizable monomer (A);
- a polymerization initiator (B);
- and
- a fluorine-containing surfactant (C),
- wherein a photo-cured product of the photo-curable composition has a water contact angle of 70 degrees or less.
2 more elements
Dependencies are inferred from the claim text.