Method of fabricating 3d nanostructured metal oxides using proximity-field nanopatterning and atomic layer deposition
AssigneeKorea Advanced Institute of Science and Technology
InventorsSeokWoo Jeon, ChangUi Ahn
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Abstract
The present invention is 3D nanostructured porous metal oxide and the method of fabricating said metal oxide, wherein said method is comprising the steps of: (a) spin-coating with photoresist onto substrate; (b) forming periodic 3D porous nanostructure patterned pore in said photoresist using proximity-field nanopatterning; (c) impregnating metal oxide into said 3D pore of photoresist having said periodic 3D pore pattern as template via atomic layered deposition (ALD) with metal precursor; and (d) obtaining 3D nanostructured porous metal oxide having the inverse shape of said template by removing said photoresist template.
Claims17
A method for fabrication of metal oxide having 3D nanostructure, wherein said method is comprising the steps of:
- (a) spin-coating photoresist onto substrate;
- (b) forming periodic 3D porous nanostructure patterned pore in said photoresist using proximity-field nanopatterning;
- (c) impregnating metal oxide into said 3D pore of photoresist having said periodic 3D pore pattern as template via atomic layered deposition (ALD) with metal precursor;
- and
- (d) obtaining 3D nanostructured porous metal oxide having the inverse shape of said template by removing said photoresist template.
3D porous nanostructured metal oxide, wherein said metal oxide has nano-size pores with regular or irregular shape along with each axis within the said metal oxide, wherein the said pores are interconnected with each other fully or partially forming channel.
Dependencies are inferred from the claim text.