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US 2014/0349073 A1Published application
Aerosol deposition coating for semiconductor chamber components
AssigneeApplied Materials, Inc.
InventorsJennifer Y. Sun, Biraja Kanungo, Tom Cho, Ying Zhang
Life of this patent
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Abstract
A method for coating a component for use in a semiconductor chamber for plasma etching includes providing the component and loading the component in a deposition chamber. A pressure in the deposition chamber is reduced to below atmospheric pressure. A coating is deposited on the component by spraying an aerosol comprising a suspension of a first type of metal oxide nanoparticle and a second type of metal oxide nanoparticle onto the component at approximately room temperature.
Claims20
A method comprising:
- providing a component for use in a semiconductor manufacturing chamber;
- loading the component into a deposition chamber;
- reducing a pressure of the deposition chamber below atmospheric pressure;
- and
- depositing a coating on the component by spraying an aerosol comprising a suspension of a first type of metal oxide nanoparticle and a second type of metal oxide nanoparticle onto the component at approximately room temperature.
2 more elements
An article comprising:
- a component for use in a semiconductor manufacturing chamber for plasma etching;
- and
- an aerosol deposited coating on the component, the aerosol deposited coating comprising a first type of metal oxide nanoparticle and a second type of metal oxide nanoparticle.
An article comprising:
- a component for use in a semiconductor manufacturing chamber for plasma etching, the component having a coating that was deposited on the component by a process comprising:
- loading the component into a deposition chamber;
- reducing a pressure of the deposition chamber below atmospheric pressure;
- and
- spraying an aerosol comprising a suspension of a first type of metal oxide nanoparticle and a second type of metal oxide nanoparticle onto the component at approximately room temperature.
2 more elements
Dependencies are inferred from the claim text.