Method of forming optoelectronic device having a stabilized metal oxide layer
AssigneeDow Global Technologies LLC
InventorsAndrzej M. Malek, Todd R. Bryden, Peter C Lebaron
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Abstract
The present invention is a method comprising depositing a metal oxide layer as part of the production of an optoelectrically active device and exposing the metal oxide layer to a reactive agent to form a relatively hydrophobic surface. The invention also includes device so made, preferably a photovoltaic device, which shows improved stability as compared to devices not subject to the treatment.
Claims10
A method comprising depositing metal oxide over at least one photoelectrically active layer as part of production of an optoelectrically active device and exposing the metal oxide to a reactive agent that reacts with oxide to form a relatively hydrophobic surface
A photovoltaic device having an absorber layer and at least one additional layer comprising a metal oxide wherein the surface of the metal oxide layer comprises the reaction product of the metal oxide with a compound that increases the resistance of the layer to moisture while having substantially no effect on the optical or electrical properties of the layer.
Dependencies are inferred from the claim text.