Method for manufacturing porous structure and method for forming pattern
AssigneeKabushiki Kaisha Toshiba
InventorsKoji ASAKAWA, Toshiro HIRAOKA, Yoshihiro AKASAKA, Yasuyuki HOTTA
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Abstract
A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
Claims2
A method for manufacturing a porous structure comprising:
- forming a molded product made of a pattern forming material;
- forming a structure having micro polymer phases in the molded product;
- and
- forming a porous structure by dry-etching the molded product to selectively remove a polymer phase from the structure having micro polymer phases;
- wherein the pattern forming material comprises a copolymer selected from the group consisting of:
- a block copolymer and a graft copolymer, each comprising two polymer chains whose ratio between N/(Nc−NO) values of respective monomer units is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit;
- and
- a block copolymer and a graft copolymer, each comprising a polysilane chain and a carbon-based organic polymer chain.
2-40. (canceled)
Dependencies are inferred from the claim text.