Method for Tracking Defects on a Photomask Across Repeated Inspections
AssigneeReticle Labs LLC
InventorMohammad Saghir Munir
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Abstract
This invention allows tracking of a defect across multiple inspections. The inventive solution translates every inspection record into a common set of fields that are first archived into a relational database. Then the defect coordinates from the inspection records of the same mask are all transformed into a common reference frame having the same origin and orientation with respect to the mask coordinate system. Following this, the defect having coordinates within a given tolerance distance are paired up and reported to the user.
Claims9
A method to track a repeated defect from a variety of mask and wafer inspection systems, comprising:
- translating—inspection reports that contain defect coordinate information into a common set of fields that are populated into a relational defect database, and
- tagging each inspection report with a unique product code or field that can relate all inspection reports belonging to the same mask or wafer, and
- transforming the defect coordinates into a base reference frame having a common origin and orientation with respect to the mask coordinate system, and
- matching all resulting defects having coordinates that fall within a tolerance distance of each other in the respective inspection records.
A computer program product comprising a computer-readable medium having computer program logic recorded thereon for tracking a repeated defect from a variety of mask and wafer inspection systems, the computer program logic comprising:
- means for translating inspection reports that contain defect coordinate information into a common set of fields that are populated into a relational defect database, and
- means for tagging each inspection report with a unique product code or field that can relate all inspection reports belonging to the same mask or wafer, and
- means for transforming the defect coordinates into a base reference frame having a common origin and orientation with respect to the mask coordinate system, and
- means for matching all resulting defects having coordinates that fall within a tolerance distance of each other in the respective inspection records.
Dependencies are inferred from the claim text.