Back to results
US 2014/0273777 A1Published application
Polishing pad having polishing surface with continuous protrusions having tapered sidewalls
AssigneeNexPlanar Corporation
InventorsPaul Andre Lefevre, William C. Allison, Alexander William Simpson, Diane Scott, Ping Huang, Leslie M. Charns, James Richard Rinehart, Robert Kerprich
Life of this patent
Estimating the term…
Abstract
Polishing pads having a polishing surface with continuous protrusions having tapered sidewalls are described. Methods of fabricating polishing pads having a polishing surface with continuous protrusions having tapered sidewalls are also described.
Claims69
A polishing pad for polishing a substrate, the polishing pad comprising:
- a polishing body having a polishing side opposite a back surface;
- and
- a polishing surface comprising a plurality of protrusions continuous with the polishing side of the polishing body, each protrusion comprising a flat surface distal from the polishing body and sidewalls tapered outwardly from the flat surface toward the polishing body.
A polishing pad for polishing a substrate, the polishing pad comprising:
- a polishing body having a polishing side opposite a back surface;
- and
- a polishing surface comprising a plurality of protrusions continuous with the polishing side of the polishing body, each protrusion having a modified-quadrilateral polygon shape in an outermost plane of the polishing surface and sidewalls tapered outwardly from the outermost plane toward the polishing body.
Dependencies are inferred from the claim text.