Polishing pad conditioner pivot point
AssigneeApplied Materials, Inc.
InventorsHung Chih Chen, Shou-Sung Chang, Jason Garcheung Fung
Life of this patent
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Abstract
A polishing system includes a polishing pad having a polishing surface and a conditioner apparatus. The conditioner apparatus includes a conditioner head constructed to receive a conditioning disk for conditioning a surface of the polishing pad, an arm that supports the conditioner head, a base that supports the arm, the arm pivotally connected to the base such that the arm is pivotable about a pivot point to change an angle of inclination of the arm, wherein the pivot point is positioned below the polishing surface of the polishing pad.
Claims13
A polishing system, comprising:
- a platen having a top surface to support a polishing pad;
- and
- a conditioner apparatus including
- a conditioner head constructed to receive a conditioner disk for conditioning a surface of the polishing pad;
- an arm that supports the conditioner head;
- a base that supports the arm, the arm pivotally connected to the base such that the arm is pivotable about a pivot point to change an angle of inclination of the arm, wherein the pivot point is positioned below a plane parallel to and positioned 130 mils above the top surface of the platen.
A polishing system, comprising:
- a polishing pad having a polishing surface;
- and
- a conditioner apparatus including
- a conditioner head constructed to receive a conditioner disk for conditioning a surface of the polishing pad;
- an arm that supports the conditioner head;
- a base that supports the arm, the arm pivotally connected to the base such that the arm is pivotable about a pivot point to change an angle of inclination of the arm, wherein the pivot point is positioned below the polishing surface of the polishing pad.
A polishing system, comprising:
- a platen having a top surface to support a polishing pad;
- and
- a conditioner apparatus including
- a conditioner head constructed to receive a conditioner disk for conditioning a surface of the polishing pad;
- an arm that supports the conditioner head;
- a base that supports the arm, the arm pivotally connected to the base such that the arm is pivotable about a pivot point to change an angle of inclination of the arm, wherein the pivot point is positioned the top surface of the platen.
Dependencies are inferred from the claim text.