Charged particle beam writing apparatus, aperture unit, and charged particle beam writing method
AssigneeNuFlare Technology, Inc.
InventorTetsuro NISHIYAMA
Life of this patent
Estimating the term…
Abstract
A charged particle beam writing apparatus according to an embodiment includes: a beam emitter configured to emit a charged particle beam; an aperture having an opening portion through which the charged particle beam emitted by the beam emitter passes; an aperture beam tube being provided on a surface of the aperture and functioning as a thermally conductive member having thermal conductivity; and a heater provided on a surface of the aperture beam tube and configured to supply heat to the aperture via the aperture beam tube.
Claims20
A charged particle beam writing apparatus comprising:
- a beam emitter configured to emit a charged particle beam;
- an aperture having an opening portion through which the charged particle beam emitted by the beam emitter passes;
- a thermally conductive member provided on a surface of the aperture and having thermal conductivity;
- and
- a heater provided on a surface of the thermally conductive member and configured to supply heat to the aperture via the thermally conductive member.
An aperture unit comprising:
- an aperture having an opening portion through which a charged particle beam passes;
- a thermally conductive member being provided on a surface of the aperture and having thermal conductivity;
- and
- a heater provided on a surface of the thermally conductive member and configured to supply heat to the aperture via the thermally conductive member.
A charged particle beam writing method comprising:
- supplying heat to an aperture via a thermally conductive member having thermal conductivity, the aperture having an opening portion through which a charged particle beam passes;
- and
- applying a charged particle beam to the opening portion of the aperture being supplied with the heat.
Dependencies are inferred from the claim text.