Integration of absorption based heating bake methods into a photolithography track system
AssigneeTokyo Electron Limited
InventorsMichael A. Carcasi, Mark H. Somervell, Benjamen M. Rathsack
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Abstract
A method of patterning a layered substrate is provided that includes forming a layer of a block copolymer on a substrate; and annealing the layer of the block copolymer to affect microphase segregation such that self-assembled domains are formed by application of an absorption based heating method. Exemplary absorption based heating methods include electromagnetic radiation sources such as broadband flash lamps, light emitting diodes, lasers, or DUV flash lamps. The method may also include a metrology review and an application of the absorption based heating to at least a portion of the layered substrate to refine or modify the microphase segregation.
Claims23
A method of patterning a layered substrate, comprising:
- a) forming a layer of a block copolymer;
- and
- b) annealing the layer of the block copolymer to affect microphase segregation such that self-assembled domains are formed, wherein the annealing is performed by application of an absorption based heating method provided by exposure to electromagnetic radiation to provide an annealing temperature in a range of 250° C. to 500° C.
A method of patterning a layered substrate, comprising:
- a) forming a layer of a block copolymer;
- b) performing a first annealing treatment of the layer of the block copolymer to affect microphase segregation such that self-assembled domains are formed;
- and
- c) exposing at least a portion of the layer of the block copolymer to electromagnetic radiation to heat the exposed portion of the layer of the block copolymer to an annealing temperature in a range of 250° C. to 500° C.
Dependencies are inferred from the claim text.