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US 2014/0273533 A1Published application
Semiconductor Annealing Method Utilizing a Vacuum Environment
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJen-Chan Tsun, Ta-Lu Cheng, Lee-Te Tseng, Yi-Hann Chen, Ming-Te Chen
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Abstract
A semiconductor annealing method and system uses a vacuum pump to produce a vacuum environment in the annealing chamber to thereby remove undesired gas element influences. A control system obtains pressure and temperature measurements from the annealing chamber to control operation of the heating elements and vacuum pump to thereby maintain process integrity.
Claims20
A semiconductor annealing method, comprising:
- heating a semiconductor wafer positioned inside an annealing chamber;
- and
- altering air pressure inside the annealing chamber to thereby create a vacuum environment.
A semiconductor annealing system, comprising:
- an annealing chamber in which to anneal a semiconductor wafer;
- a heating element to heat the semiconductor wafer during annealing;
- and
- a vacuum pump system operationally coupled to the annealing chamber to thereby produce a vacuum environment in the annealing chamber.
1 more element
A semiconductor annealing method, comprising:
- heating a semiconductor wafer positioned inside an annealing chamber;
- and
- removing gas elements from the annealing chamber.
Dependencies are inferred from the claim text.