Methods for fabricating integrated circuits including formation of chemical guide patterns for directed self-assembly lithography

A method for creating chemical guide patterns by DSA lithography for fabricating an integrated circuit comprising:

• forming a bifunctional brush layer of a polymeric material overlying an anti-reflective coating on a semiconductor substrate such that a pinning layer of the bifunctional brush layer is disposed adjacent to the anti-reflective coating and a neutral layer of the bifunctional brush layer is disposed adjacent to the pinning layer on a side opposite the anti-reflective coating, wherein the polymeric material comprises a neutral polymeric block portion and a pinning polymeric block portion that form the neutral layer and the pinning layer, respectively;
• selectively removing a portion of the neutral layer to define a chemical guide pattern;
• depositing a block copolymer layer overlying the chemical guide pattern;
• and
• phase separating the block copolymer layer to define a nanopattern that is registered to the chemical guide pattern.

A method for creating chemical guide patterns by DSA lithography for fabricating an integrated circuit comprising:

• forming a bifunctional brush layer of a polymeric material overlying an anti-reflective coating on a semiconductor substrate such that a neutral layer of the bifunctional brush layer is disposed adjacent to the anti-reflective coating and a pinning layer of the bifunctional brush layer is disposed adjacent to the neutral layer on a side opposite the anti-reflective coating, wherein the polymeric material comprises a neutral polymeric block portion and a pinning polymeric block portion that form the neutral layer and the pinning layer, respectively;
• selectively removing a portion of the pinning layer to define a chemical guide pattern;
• depositing a block copolymer layer overlying the chemical guide pattern;
• and
• phase separating the block copolymer layer to define a nanopattern that is registered to the chemical guide pattern.