Interconnection designs using sidewall image transfer (sit)
AssigneeGlobalfoundries Inc.
InventorsYoungtag WOO, Dinesh Somasekhar, Juhan Kim, Yunfei Deng, Jongwook Kye
Life of this patent
Estimating the term…
Abstract
Methodology enabling a generation of an interconnection design utilizing an SIT process is disclosed. Embodiments include: providing a hardmask on a substrate; forming a mandrel layer on the hardmask including: first and second vertical portions extending along a vertical direction and separated by a horizontal distance; and a plurality of horizontal portions extending in a horizontal direction, wherein each of the horizontal portions is positioned between the first and second vertical portions and at a different position along the vertical direction; and forming a spacer layer on outer edges of the mandrel layer.
Claims20
A method comprising:
- providing a hardmask on a substrate;
- forming a mandrel layer on the hardmask comprising:
- first and second vertical portions extending along a vertical direction and separated by a horizontal distance;
- and
- a plurality of horizontal portions extending in a horizontal direction, wherein each of the horizontal portions is positioned between the first and second vertical portions and at a different position along the vertical direction;
- and
- forming a spacer layer on outer edges of the mandrel layer.
A method comprising:
- providing a hardmask on a substrate;
- forming a mandrel layer on the hardmask comprising:
- first and second vertical portions extending along a vertical direction;
- and
- a third vertical portion extending along the vertical direction being positioned between the first and second vertical portions and separated from the first and second vertical portions;
- forming a spacer layer on outer edges of the mandrel layer;
- and
- providing a plurality of block layer portions extending in a horizontal direction and separated from the first and second vertical portions, wherein each of the block layer portions extends along an entire horizontal width of the third vertical portion and is at a different position along the vertical direction.
A method comprising:
- providing a hardmask on a substrate;
- forming a mandrel layer on the hardmask comprising:
- first and second vertical portions extending along a vertical direction;
- and
- third and fourth vertical portions extending along the vertical direction being positioned between the first and second vertical portions and each being separated from the first and second vertical portions;
- forming a spacer layer on outer edges of the mandrel layer;
- and
- providing a plurality of block layer portions extending in a horizontal direction and between the third and fourth vertical portions, wherein each of the block layer portions extends along an entire horizontal separation distance between spacers at outer edges of the third and fourth vertical portions and is at a different position along the vertical direction.
Dependencies are inferred from the claim text.