Anti-Reflective Layer and Method
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYu-Chung Su, Ching-Yu Chang, Wen-Yun Wang
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Abstract
A system and method for anti-reflective layers is provided. In an embodiment the anti-reflective layer comprises a floating component in order to form a floating region along a top surface of the anti-reflective layer after the anti-reflective layer has dispersed. The floating component may be a floating cross-linking agent, a floating polymer resin, or a floating catalyst. The floating cross-linking agent, the floating polymer resin, or the floating catalyst may comprise a fluorine atom.
Claims20
A method for manufacturing a semiconductor device, the method comprising:
- dispensing an anti-reflective material over a substrate to form an anti-reflective coating layer, the anti-reflective material having a first concentration of a floating component;
- and
- forming a floating region adjacent to a top surface of the anti-reflective coating, the floating region having a second concentration of the floating component greater than the first concentration.
A method of manufacturing a semiconductor device, the method comprising:
- applying an anti-reflective coating onto a substrate, the anti-reflective coating comprising at least one component that has a fluorine atom;
- forming a floating region along a top surface of the anti-reflective coating, wherein the floating region has a higher concentration of the at least one component than a remainder of the anti-reflective coating;
- and
- baking the anti-reflective coating to initiate a cross-linking reaction in the floating region.
An anti-reflective material comprising:
- a polymer resin;
- a cross-linking agent, wherein one of the polymer resin or the cross-linking agent comprises a fluorine atom;
- and
- a catalyst.
Dependencies are inferred from the claim text.