Advanced Targeted Microwave Degas System
AssigneeIntermolecular, Inc.
InventorsKent Riley Child, Minh Huu Le
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Abstract
In some embodiments, methods are described that allow the processing of a substrate using microwave-based degas systems. The methods allow process variables such as power, dwell time, frequency, backside cooling gas usage, backside cooling gas flow rate, and the like to be investigated. In some embodiments, apparatus are described that allow the investigation of process variables used in microwave-based degas systems to remove adsorbed species from the surface of a substrate. The apparatus allow process variables such as power, dwell time, frequency, backside cooling gas usage, backside cooling gas flow rate, and the like to be investigated.
Claims20
A method for processing a substrate, the method comprising
- transferring a substrate into a first process chamber;
- exposing a surface of the substrate to microwave radiation, wherein the microwave radiation has a frequency of about 2.45 GHz;
- after the exposing, transferring the substrate to a second process chamber;
- and
- after the transferring, processing the substrate.
An apparatus comprising:
- a first process chamber;
- a remote microwave source;
- a waveguide, wherein the waveguide is operable to deliver microwave radiation from the remote microwave source to the first process chamber;
- a substrate support;
- and
- a delivery nozzle, wherein the delivery nozzle is operable to deliver microwave radiation from the waveguide to a surface of a substrate disposed upon the substrate support.
Dependencies are inferred from the claim text.