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US 2014/0273339 A1Published application
Semiconductor Polymers
AssigneeSaudi Basic Industries Corporation
InventorsDwight Seferos, Brandon Djukic, Amit Tevtia
Life of this patent
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Abstract
Disclosed is a semiconductor polymer having the following structure:
Claims23
A polymer having a structure of:
- wherein
- R1 and R2 are each independently selected from the group consisting of H, C1-30-alkyl, C2-30-alkenyl, C2-30-alkynyl, C3-10-cycloalkyl, C5-10-cycloalkenyl, 3-14 membered cycloheteroalkyl, C6-14-aryl and 5-14 membered heteroaryl,
- R3, R4, R9, and R10 are each independently hydrogen, or —CN,
- R5, R6, R7, and R8 are each independently hydrogen, a halogen selected from the group consisting of fluorine, chlorine, bromine iodine, and astatine, —CN, —NO2, —OH, —O—CH2CH2O—C1-10-alkyl, —O—COX1, —S—C1-10-alkyl, —NH2, —NHX1, —NX1X2, —NH—COX1, —COOH, —COORS, —CONH2, —CONHX1, —CONX1X2, —CO—H, —COX1, C3-10-cycloalkyl, 3-14 membered cycloheteroalkyl, C6-14-aryl or a 5-14 membered heteroaryl, with the proviso that neither of R5, R6, R7, and R8 are alkoxy groups (—OX1) or at least three or all four of R5, R6, R7, and R8 are alkoxy groups,
- wherein
- X1 and X2 are each independently C1-10-alkyl, C2-10-alkenyl, C2-10-alkynyl, C3-10-cycloalkyl, C5-10-cycloalkenyl, 3-14 membered cycloheteroalkyl, C6-14-aryl and 5-14 membered heteroaryl, and
- n is an integer from 2 to 1000.
4 more elements
A process for making a photoactive layer on a substrate, wherein the photoactive layer comprises the polymer of claim 1, the process comprising disposing the solution of claim 28 on the substrate and drying said solution to form the photoactive layer.
Dependencies are inferred from the claim text.