Solvent anneal processing for directed-self assembly applications

A solvent annealing apparatus for a solvent-assisted annealing of a layer of a block copolymer, comprising:

• a processing chamber comprising a process space;
• a substrate support in the process space, the substrate support having a support surface and being configured to support the substrate in the process space in a spaced relationship with the support surface to define a processing environment between the support surface and the substrate;
• an annealing gas supply in fluid communication with the process space, the anneal gas supply configured to supply an annealing gas to the process space;
• a heating element positioned within the processing chamber configured to heat the substrate by heat transfer through the processing environment or the substrate support;
• an exhaust port in the processing chamber configured in fluid communication with an isolation valve;
• a purge gas supply in fluid communication with the process space, the purge gas supply configured to supply a purge gas to the process space effective to displace the annealing gas from the process space;
• and
• a sequencing device electrically coupled to the annealing gas supply, the heating element, the isolation valve of the exhaust port, and the purge gas supply, wherein the sequencing device is programmed to control the annealing gas supply, the heating element, the isolation valve of the exhaust port, and the purge gas supply.