Silicon-nitride-containing interlayer of great hardness
AssigneeEsk Ceramics GmbH & Co. KG
InventorsKrishna Uibel, David W. Worthey
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Abstract
The invention relates to a shaped body comprising a substrate with a firmly adhering separating layer, wherein the separating layer comprises 92-98 wt. % silicon nitride (Si3N4) and 2-8 wt. % silicon dioxide (SiO2) and wherein the separating layer has a total oxygen content of ≦8 wt. % and a hardness of at least 10 HB 2.5/3 according to DIN EN ISO 6506-1. The invention further relates to a process for producing such a shaped body, a coating suspension for use in such a process and the use of a shaped body according to the invention in the field of corrosive nonferrous metal melts.
Claims20
Shaped body comprising a substrate with a firmly adhering separating layer, wherein the separating layer comprises 92-98 wt. % silicon nitride (Si3N4) and 2-8 wt. % silicon dioxide (SiO2) and wherein the separating layer has a total oxygen content of ≧8 wt. % and a hardness of at least 10 HB 2.5/3 according to DIN EN ISO 6506-1.
Dependencies are inferred from the claim text.