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US 2014/0272716 A1Published application
Photoresist System and Method
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsWei-Han Lai, Ching-Yu Chang
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Abstract
A system and method for photoresists is provided. In an embodiment the photoresist is exposed in a photoresist track system and developed in an offline developing system. After the photoresist is exposed, the photoresist may be idled for a time period prior to being developed in the offline developing system.
Claims20
A method of manufacturing a semiconductor device, the method comprising:
- exposing a photoresist on a substrate, the exposing the photoresist being performed in a photoresist track system;
- removing the photoresist from the photoresist track system;
- and
- developing the photoresist in an offline developing system, the developing the photoresist being performed at least in part with a negative tone developer.
1 more element
A method of manufacturing a semiconductor device, the method comprising:
- exposing a photoresist in an exposure station of a photoresist track system;
- idling the photoresist for a first time period;
- and
- after the idling the photoresist, developing the photoresist with a negative tone developer in a negative tone developing station, the negative tone developing station being separate from the photoresist track system.
1 more element
A photoresist polymer resin comprising:
- a repeating unit;
- and
- a polymer bound photoacid generator.
A photoresist polymer comprising:
- a skeletal backbone;
- and
- a high energy activity acid labile group.
Dependencies are inferred from the claim text.