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US 2014/0272706 A1Published application
Resist composition and method for forming pattern
AssigneeFujitsu Limited
InventorsJunichi Kon, Yoshihiro NAKATA
Life of this patent
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Abstract
A resist composition includes: a solvent; and a resin in the solvent, the resin being prepared by the hydrolysis and condensation of an alkoxy group-containing compound that contains an alkoxy group bound to a silicon atom or a germanium atom in the presence of an acid or an alkali, wherein a portion of the resist composition irradiated with an energy radiation is insoluble in a developing solution.
Claims10
A resist composition comprising:
- a solvent;
- and
- a resin in the solvent, the resin being prepared by the hydrolysis and condensation of an alkoxy group-containing compound that contains an alkoxy group bound to a silicon atom or a germanium atom in the presence of an acid or an alkali,
- wherein a portion of the resist composition irradiated with an energy radiation is insoluble in a developing solution.
1 more element
A method for forming a pattern, comprising:
- preparing a resist composition containing
- a solvent;
- and
- a resin in the solvent, the resin being prepared by the hydrolysis and condensation of an alkoxy group-containing compound that contains an alkoxy group bound to a silicon atom or a germanium atom in the presence of an acid or an alkali, and a portion of the resist composition irradiated with an energy radiation being insoluble in a developing solution;
- arranging the prepared resist composition on a substrate;
- partially irradiating the arranged resist composition with the energy radiation;
- and
- removing a portion of the resist composition that is not irradiated with the energy radiation from the substrate using the developing solution.
5 more elements
Dependencies are inferred from the claim text.