Thermal treated sandwich structure layer to improve adhesive strength
OwnerRen-Guan DUAN, Juan Carlos ROCHA- ALVAREZinventors
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OwnerRen-Guan DUAN, Juan Carlos ROCHA- ALVAREZinventors
Estimating the term…
A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a processing chamber. The processing chamber includes a substrate support assembly disposed in the bottom portion of the processing chamber, a gas distribution system configured to provide gas into the processing chamber above the substrate support assembly, a removable liner layer the chamber interior walls. An adhesion layer is disposed on the substrate support. A protective layer is disposed on the adhesion layer. Pluralities of intermediate layers are created between the substrate support layer and the adhesion layer, and the adhesion layer and the protective layer through a thermal treatment in a non-reactive environment.
A protective coating;
A method for protecting a surface of a chamber component, comprising:
A protective coating for a substrate support structure comprising:
Dependencies are inferred from the claim text.