Low-E Glazing Performance by Seed Structure Optimization

A method to form a low emissivity coating, the method comprising

• providing a transparent substrate;
• forming a first layer above the transparent substrate, wherein the first layer comprises at least one of aluminum doped tin oxide, magnesium doped tin oxide, or bismuth doped tin oxide;
• forming a second layer above the first layer, wherein a thickness of the second layer is between 2 nm and 4 nm, wherein the second layer comprises zinc oxide having a (002) crystallographic orientation;
• forming a third layer on the second layer, wherein the third layer comprises silver having a (111) crystallographic orientation.

A low emissivity panel, comprising

• a transparent substrate;
• a first layer disposed above the transparent substrate, wherein the first layer comprises at least one of aluminum doped tin oxide, magnesium doped tin oxide, or bismuth doped tin oxide;
• a second layer disposed above the first layer, wherein a thickness of the second layer is between 2 nm and 4 nm, wherein the second layer comprises zinc oxide having a (002) crystallographic orientation;
• a third layer disposed above the second layer, wherein the third layer comprises silver having a (111) crystallographic orientation.