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US 2014/0272333 A1Published application
Metamaterial and Method for Forming a Metamaterial Using Atomic Layer Deposition
AssigneeRobert Bosch GmbH
InventorsFabian Purkl, John Provine, Gary Yama, Ando Feyh, Gary O'Brien
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Abstract
A metamaterial includes a first continuous layer formed with a first material by atomic layer deposition (ALD), a first non-continuous layer formed with a second material by ALD on first upper surface portions of a first upper surface of the first continuous layer, and a second continuous layer formed with the first material by ALD on second upper surface portions of the first upper surface of the first continuous layer and on a second upper surface of the first non-continuous layer.
Claims14
A metamaterial comprising:
- a first continuous layer formed with a first material by atomic layer deposition (ALD);
- a first non-continuous layer formed with a second material by ALD on first upper surface portions of a first upper surface of the first continuous layer;
- and
- a second continuous layer formed with the first material by ALD on second upper surface portions of the first upper surface of the first continuous layer and on a second upper surface of the first non-continuous layer.
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A method of forming a metamaterial comprising:
- forming a first continuous layer with a first material by atomic layer deposition (ALD);
- forming a first non-continuous layer with a second material by ALD on first upper surface portions of a first upper surface of the first continuous layer;
- and
- forming a second continuous layer with the first material by ALD on second upper surface portions of the first upper surface of the first continuous layer and on a second upper surface of the first non-continuous layer.
1 more element
Dependencies are inferred from the claim text.