Patterned multilayered stack, and system and method for making the same

A method of making a barrier film, the method comprising:

• forming a first layer comprising a barrier layer over a substrate, the first layer having an area less than or equal to an area of the substrate;
• forming a second layer comprising a decoupling or planarization layer having an area less than the area of the first layer over the first layer;
• and
• forming a third layer comprising a barrier layer having an area greater than an area of the second layer and less than or equal to an area of the substrate over the second layer;
• wherein the second layer is completely enclosed between the first and third layers defining an edge perimeter surrounding the second layer that is completely sealed between the first and third layers, and
• wherein forming at least one of the first, second, or third layers comprises depositing a pattern of the respective first, second, or third layer, each portion of the pattern of the second layer being completely enclosed between respective adjacent first and third layers or portions thereof.

A method of making a barrier film, the method comprising:

• depositing a first layer comprising a barrier material having an area less than or equal to an area of a substrate over a substrate at a first deposition station;
• depositing a second layer comprising a decoupling or planarization material having an area less than the area of the first layer over the first layer at a second deposition station;
• and
• depositing a third layer comprising a barrier material having an area greater than an area of the second layer and less than or equal to an area of the substrate over the second layer at a third deposition station;
• wherein the second layer is completely enclosed between the first and third layers defining an edge perimeter surrounding the second layer that is completely sealed between the first and third layers, and
• wherein forming at least one of the first, second, or third layers comprises depositing a pattern of the respective first, second, or third layer, each portion of the pattern of the second layer being completely enclosed between respective adjacent first and third layers or portions thereof.