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US 2014/0272136 A1Published application
Chemical Vapor Deposition of Graphene Using a Solid Carbon Source
AssigneeBluestone Global Tech Limited
InventorXuesong Li
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Abstract
Aspects of the invention are directed to a method of forming a film on a substrate. The substrate and a solid carbon source are placed into a reactor. Subsequently, both the substrate and the solid carbon source are heated. Optionally, one or more process gases may be introduced into the reactor to help drive the formation of the film. The film comprises graphene.
Claims20
A method of forming a film on a substrate, the method comprising the steps of:
- placing the substrate into a reactor;
- placing a solid carbon source into the reactor;
- and
- heating both the substrate and the solid carbon source in the reactor;
- wherein the film comprises graphene.
2 more elements
Dependencies are inferred from the claim text.