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US 2014/0272105 A1Published application
System and methods of reducing diffuse reflection of an optical stack
AssigneeCambrios Technologies Corporation
InventorsViktor Podolskiy, Michael A. Spaid, Jeffrey Wolk, Haixia Dai
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Abstract
The present disclosure relates to a method for improving optical qualities of transparent conductive films including a multilayer optical stack and conductive nanowires embedded therein.
Claims31
A method comprising:
- selecting optical stack parameters for an optical stack with a nanowire;
- calculating a plurality of sets of diffuse reflection values for each one of a plurality of optical stack configurations according to the optical stack parameters, each set of diffuse reflection values including a plurality of diffuse reflection values for respective angles of reflection from the optical stack:
- selecting one of the optical stack configurations based at least in part on a comparison of the sets of diffuse reflection values for the plurality of angles;
- and
- forming layers of the optical stack according to the selected optical stack configuration.
2 more elements
A method comprising:
- storing the input optical stack parameters in a memory circuit coupled to the processor;
- computing, in the processor, a plurality of sets of diffuse reflection values for a plurality of optical stacks each having a respective configuration in accordance with the optical stack parameters, each set of diffuse reflection values including a plurality of diffuse reflection values for respective angles of reflection from a surface of the optical stack, calculating the sets of diffuse reflection including, for each configuration, respectively:
- computing a value of electromagnetic field from incident light at a position within an optical stack corresponding to a position of a nanowire in the optical stack;
- and
- computing transfer matrices to provide the plurality of values of diffuse reflection for the plurality of angles of reflection from the surface of the optical stack based in part on the value of electromagnetic field.
- selecting an optical stack configuration based on the values of diffuse reflection.
3 more elements
A system comprising:
- a processor;
- a memory coupled to the processor;
- an input coupled to the processor and configured to receive first parameters of an optical stack, the processor being configured to compute a set of incident light electromagnetic field values for a position corresponding to a nanowire in an optical stack, compute a light scattering profile of the nanowire, compute a plurality of sets of values of diffuse reflection at a surface of the optical stack, and estimate a set of second parameters of the optical stack, the second parameters corresponding to a preferred set of values diffuse reflection, each set of values of diffuse reflection including a plurality of diffuse reflection values for respective angles of reflection from the surface of the optical stack;
- and
- an output coupled to the processor and configured to receive the second parameters from the processor.
2 more elements
A method comprising:
- inputting parameters of an optical stack to a processor;
- estimating, in the processor, a set of values of electromagnetic field from incident light for a position corresponding to a nanowire in an optical stack;
- estimating, in the processor, a light scattering profile of the nanowire;
- estimating, in the processor, a plurality of sets of values of diffuse reflection at a surface of the optical stack based on electromagnetic field values and the scattering cross-section, each set of values of diffuse reflection including a plurality of values of diffuse reflection for respective angles of reflection from the surface of the optical stack;
- and
- outputting from the processor an optical stack configuration corresponding to a selected set of values of diffuse reflection.
3 more elements
Dependencies are inferred from the claim text.