Processing systems and methods for halide scavenging

A substrate processing system comprising:

• a plurality of holding chambers;
• a plurality of loading chambers configured to receive substrates into a vacuum environment;
• an interface section having at least two interface transfer devices configured to deliver substrates between the plurality of holding chambers coupled with the interface section at a first location of the interface section and the plurality of loading chambers coupled with the interface section at a second location of the interface section opposite the plurality of holding chambers;
• a treatment chamber positioned in vertical alignment to and coupled with at least one of the plurality of loading chambers;
• a plurality of process chambers;
• and
• a process transfer device configured to deliver a substrate between any of the plurality of loading chambers and any of the plurality of processing chambers while maintaining the substrate under vacuum conditions, wherein the process transfer device is further configured to deliver substrates vertically to the treatment chamber.