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US 2014/0262765 A1Published application
Deposition System With A Rotating Drum
AssigneeVaeco Inc.
InventorRichard DeVito
Life of this patent
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Abstract
A deposition method comprises flowing a first gas into a metallization zone maintained at a first pressure. A second gas flows into a reaction zone maintained at a second pressure. The second pressure is less than the first pressure. A rotating drum includes at least one substrate mounted to a surface of the drum. The surface alternately passes through the metallization zone and passes through the reaction zone. A target is sputtered in the metallization zone to create a film on the at least one substrate. The film on the at least one substrate is reacted in the reaction zone.
Claims31
1-20. (canceled)
A deposition system, comprising:
- a film-deposition zone including a deposition source for film deposition;
- a reaction zone including a source for generating reactive species;
- a rotatable mount configured to hold at least one substrate and to pass at least a portion of the substrate alternately between said first and second zones so as to deposit a film on at least a portion of the substrate in the first zone and to react the deposited film with the reactive species in the second zone;
- wherein said film-deposition zone and reaction zone are configured to be maintained at two different pressures.
1 more element
Dependencies are inferred from the claim text.