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US 2014/0246630 A1Published application
Continuous process and continuous reacting apparatus for synthesizing semiconductor gases
AssigneeDuck Joo YANG
InventorDuck Joo Yang
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Abstract
The present invention relates to a continuous process and a continuous reacting apparatus for synthesizing a semiconductor gas including germane (GeH4) or arsine (AsH3) gas.
Claims22
A continuous process for synthesizing a semiconductor gas, the continuous process comprising:
- (a) separating and obtaining a semiconductor gas including a germane gas or an arsine gas produced from a reaction by continuously introducing each of an acidic solution, and a first reactant including a mixture of an alkaline solution containing a germanium compound or an arsenic compound with a reducing agent-containing solution into a first reactor;
- (b) supplying a solution into a second reactor, wherein the solution contains a byproduct and/or an unreacted material from which the semiconductor gas including the germane gas or the arsine gas is separated;
- (c) producing a second reactant by introducing an alkaline solution into the second reactor to control a pH of the solution containing the byproduct and/or the unreacted material to be in an alkaline range, introducing an oxidizing agent to oxidize the byproduct and/or the unreacted material, and introducing a reducing agent-containing solution;
- and
- (d) additionally obtaining the semiconductor gas including the germane gas or the arsine gas by supplying the second reactant to the first reactor to make a reaction between the second reactant and the acidic solution continuously introduced into the first reactor.
2 more elements
A continuous reacting apparatus for synthesizing a semiconductor gas, comprising:
- a first reactor connected to a first reactant inlet for introducing a first reactant including a mixture of an alkaline solution containing a germanium compound or an arsenic compound with a reducing agent-containing solution, an acidic solution inlet, a condenser, and a residue collection unit;
- and
- a second reactor connected to the residue collection unit, an alkaline solution inlet, an oxidizing agent inlet, and a reducing agent-containing solution inlet,
- wherein the first reactant and an acidic solution are continuously supplied into the first reactor through the first reactant inlet and the acidic solution inlet, respectively;
- a semiconductor gas including a germane gas or an arsine gas produced from a reaction between the first reactant and the acidic solution respectively and continuously supplied into the first reactor is separated and obtained via the condenser;
- and
- the residue collection unit collects a byproduct and/or an unreacted material from the first reactor, the byproduct and/or the unreacted material is supplied to the second reactor and reacted with an alkaline solution, an oxidizing agent, and a reducing agent-containing solution in sequence within the second reactor to produce a second reactant, and the second reactant is supplied into the first reactor and reacted with the acidic solution continuously supplied into the first reactor to additionally obtain the semiconductor gas including the germane gas or the arsine gas.
4 more elements
Dependencies are inferred from the claim text.