Substrate processing apparatus, simulation apparatus, storage medium and simulation method
AssigneeTokyo Electron Limited
InventorsSatoko YAMAMOTO, Kimitoshi MIURA
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AssigneeTokyo Electron Limited
InventorsSatoko YAMAMOTO, Kimitoshi MIURA
Estimating the term…
A substrate processing apparatus includes a substrate processing apparatus, including: a substrate processing chamber configured to accommodate a substrate and process the substrate; a piping coupled to the substrate processing chamber to allow a gas for processing the substrate to be introduced therethrough; and a simulation apparatus configured to simulate a path in which the gas for processing the substrate flows through the piping. The simulation apparatus includes: an information acquisition unit configured to acquire gas flow information defined by an operation mode in which the substrate is processed; a path determination unit configured to determine a gas path based on the gas flow information acquired by the information acquisition unit; and a simulation unit configured to simulate a flow of the gas by putting a color defined according to the type of gas on the gas path determined by the path determination unit.
A substrate processing apparatus, comprising:
A simulation apparatus configured to simulate a path in which a gas for processing a substrate flows through a piping introduced into a processing chamber configured to process the substrate, the simulation apparatus comprising:
A non-transitory computer readable storage medium for storing computer program adapted to cause a computer to execute a process of simulating a path in which a gas for processing a substrate flows through a piping introduced into a processing chamber configured to process the substrate, the process comprising:
A simulation method of simulating a path in which a gas for processing a substrate flows through a piping introduced into a substrate processing chamber configured to process the substrate, the method comprising:
Dependencies are inferred from the claim text.