Substrate rapid thermal heating system and methods

A method for heat treating substrates, said method comprising:

• directing heat radiation from a plurality of heat lamps through a heat slot thereby forming a heat radiation beam and directing said heat radiation beam onto a beam area portion on a platen;
• positioning a plurality of substrates on said platen;
• rotating said platen;
• and
• translating said platen relative to said heat slot,
• wherein said rotating and translating cause said heat radiation beam to heat all portions of each said substrate.

A method for heat treating substrates, said method comprising:

• providing a beam of heat radiation having a beam area at a surface level;
• providing a plurality of substrates on a platen disposed substantially at said surface level, each said substrate having an area greater than said beam area;
• and
• maneuvering said platen according to a program that causes motion of said platen along said surface level, such that all areas of each of said substrates are exposed to said beam of heat radiation.