Diarylamine novolac resin
AssigneeNissan Chemical Industries, Ltd.
InventorsRikimaru Sakamoto, Yasunobu Someya, Keisuke Hashimoto, Hirokazu Nishimaki
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AssigneeNissan Chemical Industries, Ltd.
InventorsRikimaru Sakamoto, Yasunobu Someya, Keisuke Hashimoto, Hirokazu Nishimaki
Estimating the term…
A novel diarylamine novolac resin such as a phenylnaphthylamine novolac resin, and further a resist underlayer film-forming composition in which the resin is used in a lithography process for manufacturing a semiconductor device. A polymer including a unit structure (A) of Formula (1): (in Formula (1), each of Ar1 and Ar2 is a benzene ring or a naphthalene ring). A method for manufacturing a semiconductor device, including: forming an underlayer film on a semiconductor substrate with the resist underlayer film-forming composition; forming a hardmask on the underlayer film; forming a resist film on the hardmask; forming a resist pattern by irradiation with light or an electron beam followed by development; etching the hardmask with the resist pattern; etching the underlayer film with the hardmask thus patterned; and processing the semiconductor substrate with the underlayer film thus patterned.
A polymer comprising:
Dependencies are inferred from the claim text.