Ion implantation method and ion implantation apparatus
AssigneeSen Corporation
InventorsShiro NINOMIYA, Tetsuya Kudo, Akihiro Ochi
Life of this patent
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Abstract
An ion implantation method includes reciprocally scanning an ion beam, mechanically scanning a wafer in a direction perpendicular to the ion beam scanning direction, implanting ions into the wafer, and generating an ion implantation amount distribution in a wafer surface of an isotropic concentric circle shape for correcting non-uniformity in the wafer surface in other semiconductor manufacturing processes, by controlling a beam scanning speed in the ion beam scanning direction and a wafer scanning speed in the mechanical scanning direction at the same time and independently using the respective control functions defining speed correction amounts.
Claims8
1-15. (canceled)
An ion implantation method comprising:
- reciprocally scanning an ion beam;
- mechanically scanning a wafer in a direction perpendicular to an ion beam scanning direction;
- implanting ions into the wafer;
- and
- generating an ion implantation amount distribution in a wafer surface of an elliptical shape for correcting non-uniformity in the wafer surface in other semiconductor manufacturing processes, by performing speed control of a beam scanning speed in the ion beam scanning direction and a wafer scanning speed in a mechanical scanning direction at the same time and independently using the respective control functions defining speed correction amounts.
An ion implantation apparatus which implants ions into a wafer, comprising a control system that reciprocally scans an ion beam and mechanically scans the wafer in a direction perpendicular to an ion beam scanning direction, wherein the control system generates an ion implantation amount distribution in a wafer surface of an elliptical shape for correcting non-uniformity in the wafer surface in other semiconductor manufacturing processes, by performing speed control of a beam scanning speed in the ion beam scanning direction and a wafer scanning speed in a mechanical scanning direction at the same time and independently using the respective control functions defining speed correction amounts.
(canceled)
Dependencies are inferred from the claim text.