Photosensitive resin composition and method of forming pattern using the same

A method of forming a pattern, the method comprising

• disposing a photosensitive resin composition on a substrate,
• exposing the photosensitive resin composition, and
• developing the photosensitive resin composition,
• wherein the photosensitive resin composition comprises:
• an acrylic copolymer comprising a polymerization product of
• a first monomer comprising at least one selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and
• a second monomer comprising an olefin-based unsaturated compound;
• a photosensitive component comprising at least one 1,2-quinonediazide-5-sulfonic acid ester compound selected from compounds represented by Chemical Formulas 1 to 4:
• wherein R1 is a hydroxyl group or a methyl group, and NQD is a 1,2-quinonediazide 5-sulfonyl group;
• a coupling agent;
• and
• a solvent,
• wherein a total amount of asymmetric compounds in the photosensitive component is greater than or equal to 45 area percent as determined by high performance liquid chromatography.