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US 2014/0233929 A1Published application
Edge ring for a thermal processing chamber
AssigneeApplied Materials, Inc.
InventorsBlake KOELMEL, Joseph M. RANISH, Abhilash J. MAYUR
Life of this patent
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Abstract
Embodiments of the present invention provide an edge ring for supporting a substrate with increased temperature uniformity. More particularly, embodiments of the present invention provide an edge ring having one or more surface area increasing structures formed on an energy receiving surface of the edge ring.
Claims14
An edge ring for supporting a substrate in a processing chamber, comprising:
- a ring shaped body having an inner edge, an outer edge, an upper side and a lower side, wherein the inner edge and outer edge are concentric about a central axis;
- a lip extending radially inward from the inner edge of the ring shaped body, wherein at least a portion of an upper surface of the lip is substantially parallel to a major plane that is perpendicular to the central axis;
- one or more surface area increasing structures extending from at least one of the upper side or lower side of the ring shaped body;
- and
- a positioner extending from the ring shaped body.
2 more elements
A substrate support, comprising:
- a body forming a closed loop, wherein the body is equal in width around the closed loop;
- a lip extending inward from the body, wherein the lip has an upper surface configured to receive a substrate around an outer edge of the substrate, and the body surrounds the substrate when the substrate is disposed on the lip;
- one or more surface area increasing structures extending from an upper surface or a lower surface of the body;
- and
- a positioner extending from the ring shaped body near an outer edge of the body.
2 more elements
Dependencies are inferred from the claim text.