Optical element, window material, fitting, and solar shading device

An optical element comprising:

• a first optical layer having a concave-convex surface;
• a wavelength-selective reflection layer formed on the concave-convex surface;
• and
• a second optical layer formed on the wavelength-selective reflection layer,
• wherein the wavelength-selective reflection layer has a five-layer structure in which a high-refractive-index layer and a metal layer are alternately stacked, and in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 90 nm, a ratio α (=db/da) of an optical film thickness db of the entire metal layer relative to an optical film thickness da of the entire high-refractive-index layer and a ratio β (=d3/d1) of an optical film thickness d3 of the third high-refractive-index layer relative to an optical film thickness d1 of the first high-refractive-index layer, when viewed from either the first optical layer side or the second optical layer side, are included in a first region surrounded by the following formulas (5) to (8), while in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 100 nm, the ratio α and the ratio β are included in a second region surrounded by the following formulas (9) to (12), and
• wherein in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 90 nm<L<100 nm,
• supposing that each of minute sides formed by dividing a periphery C1 of the first region into n-equal portions, with an intersection between the formula (5) and formula (7) being set as a starting point, is represented as ΔC1i (where i represents a natural number from 0 to n), that each of minute sides formed by dividing a periphery C2 of the second region into n-equal portions, with an intersection between the formula (9) and formula (11) being set as a starting point, is represented as ΔC2i and that each of minute regions having a rectangular shape, with ΔC1i and ΔC2i being formed as the two short sides, is defined as ΔSi, the ratio α and the ratio β are surrounded by a circumferential surface S composed of a group of minute regions ΔSi.
• α=−0.0002β2+0.0039β+0.0087 (5)
• α=−3×10−5β2+0.0014β+0.0038 (6)
• α=−2×10−5β2+0.0006β+0.0112 (7)
• α=0.010589 (8)
• α=−0.0002β2+0.0055β+0.0057 (9)
• α=−0.0002β2+0.0045β−0.0067 (10)
• α=−4×10−5β2+0.001β+0.0099 (11)
• α=0.009403 (12)

An optical element comprising:

• a first optical layer having a concave-convex surface;
• a wavelength-selective reflection layer formed on the concave-convex surface;
• and
• a second optical layer formed on the wavelength-selective reflection layer,
• wherein the wavelength-selective reflection layer has a five-layer structure in which a high-refractive-index layer and a metal layer are alternately stacked, and in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 100 nm, a ratio α (=db/da) of an optical film thickness db of the entire metal layer relative to an optical film thickness da of the entire high-refractive-index layer and a ratio β (=d3/d1) of an optical film thickness d3 of the third high-refractive-index layer relative to an optical film thickness d1 of the first high-refractive-index layer, when viewed from either the first optical layer side or the second optical layer side, are included in a first region surrounded by the following formulas (9) to (12), while in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 120 nm, the ratio α and the ratio β are included in a second region surrounded by the following formulas (13) to (16), and
• wherein in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 100 nm<L<120 nm,
• supposing that each of minute sides formed by dividing a periphery C1 of the first region into n-equal portions, with an intersection between the formula (9) and formula (11) being set as a starting point, is represented as ΔC1i (where i represents a natural number of 0 to n), that each of minute sides formed by dividing the periphery C2 of the second region into n-equal portions, with an intersection between the formula (13) and formula (15) serving as a starting point, is represented as ΔC2i and that each of minute regions having a rectangular shape, with ΔC1i and ΔC2i being formed as the two short sides, is defined as ΔSi, the ratio α and the ratio β are surrounded by a circumferential surface S composed of a group of the minute regions ΔSi.
• α=−0.0002β2+0.0055β+0.0057 (9)
• α=−0.0002β2+0.0045β−0.0067 (10)
• α=−4×10−5β2+0.001β+0.0099 (11)
• α=0.009403 (12)
• α=−0.0003β2+0.0074β+0.0033 (13)
• α=−0.0014β2+0.0191β−0.0422 (14)
• α=−9×10−5β2+0.0015β+0.0084 (15)
• α=0.007709 (16)

An optical element comprising:

• a first optical layer having a concave-convex surface;
• a wavelength-selective reflection layer formed on the concave-convex surface;
• and
• a second optical layer formed on the wavelength-selective reflection layer, wherein the wavelength-selective reflection layer has a five-layer structure in which a high-refractive-index layer and a metal layer are alternately stacked, and in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 120 nm, a ratio α (=db/da) of an optical film thickness db of the entire metal layer relative to an optical film thickness da of the entire high-refractive-index layer and a ratio β (=d3/d1) of an optical film thickness d3 of the third high-refractive-index layer relative to an optical film thickness d1 of the first high-refractive-index layer, when viewed from either the first optical layer side or the second optical layer side, are included in a first region surrounded by the following formulas (13) to (16), while in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 140 nm, the ratio α and the ratio β are included in a second region surrounded by the following formulas (17) to (20), and
• wherein in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 120 nm<L<140 nm,
• supposing that each of minute sides formed by dividing a periphery C1 of the first region into n-equal portions, with an intersection between the formula (13) and formula (15) being set as a starting point, is represented as ΔC1i (where i represents a natural number of 0 to n), that each of minute sides formed by dividing the periphery C2 of the second region into n-equal portions, with an intersection between the formula (17) and formula (19) serving as a starting point, is represented as ΔC2i and that each of minute regions having a rectangular shape, with ΔC1i and ΔC2i being formed as the two short sides, is defined as ΔSi, the ratio α and the ratio β are surrounded by a circumferential surface S composed of a group of minute regions ΔSi.
• α=−0.0003β2+0.0074β+0.0033 (13)
• α=−0.0014β2+0.0191β−0.0422 (14)
• α=−9×10−5β2+0.0015β+0.0084 (15)
• α=0.007709 (16)
• α=−0.0014β2+0.0136β−0.0027 (17)
• β=10132α2−241.39α+4.747 (18)
• α=−0.0001β2+0.002β+0.0074 (19)
• α=0.006523 (20)

An optical element comprising:

• a first optical layer having a concave-convex surface;
• a wavelength-selective reflection layer formed on the concave-convex surface;
• and
• a second optical layer formed on the wavelength-selective reflection layer,
• wherein the wavelength-selective reflection layer has a five-layer structure in which a high-refractive-index layer and a metal layer are alternately stacked, and in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 140 nm, a ratio α (=db/da) of an optical film thickness db of the entire metal layer relative to an optical film thickness da of the entire high-refractive-index layer and a ratio β (=d3/d1) of an optical film thickness d3 of the third high-refractive-index layer relative to an optical film thickness d1 of the first high-refractive-index layer, when viewed from either the first optical layer side or the second optical layer side, are included in a first region surrounded by the following formulas (17) to (20), while in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 160 nm, the ratio α and the ratio β are included in a second region surrounded by the following formulas (21) to (25), and
• wherein in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 140 nm<L<160 nm,
• supposing that each of minute sides formed by dividing a periphery C1 of the first region into n-equal portions, with an intersection between the formula (17) and formula (19) being set as a starting point, is represented as ΔC1i (where i represents a natural number of 0 to n), that each of minute sides formed by dividing the periphery C2 of the second region into n-equal portions, with an intersection between the formula (21) and formula (24) serving as a starting point, is represented by ΔC2i and that each of minute regions having a rectangular shape, with ΔC1i and ΔC2i being formed as the two short sides, is defined as ΔSi, the ratio α and the ratio β are surrounded by a circumferential surface S composed of a group of minute regions ΔSi.
• α=−0.0014β2+0.0136β−0.0027 (17)
• β=10132α2−241.39α+4.747 (18)
• α=−0.0001β2+0.002β+0.0074 (19)
• α=0.006523 (20)
• α=−0.005β2+0.0273β−0.0145 (21)
• α=0.0043β2−0.0332β+0.07 (22)
• β=2.875 (23)
• α=−0.0001β2+0.0025β+0.0062 (24)
• α=0.005676 (25)

An optical element comprising:

• a first optical layer having a concave-convex surface;
• a wavelength-selective reflection layer formed on the concave-convex surface;
• and
• a second optical layer formed on the wavelength-selective reflection layer,
• wherein the wavelength-selective reflection layer has a five-layer structure in which a high-refractive-index layer and a metal layer are alternately stacked, and in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 160 nm, a ratio α (=db/da) of an optical film thickness db of the entire metal layer relative to an optical film thickness da of the entire high-refractive-index layer and a ratio β (=d3/d1) of an optical film thickness d3 of the third high-refractive-index layer relative to an optical film thickness d1 of the first high-refractive-index layer, when viewed from either the first optical layer side or the second optical layer side, are included in a first region surrounded by the following formulas (21) to (25), while in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 180 nm, the ratio α and the ratio β are included in a second region surrounded by the following formulas (26) to (29), and
• wherein in the case when the entire wavelength-selective reflection layer has a geometric film thickness L of 160 nm<L<180 nm,
• supposing that each of minute sides formed by dividing a periphery C1 of the first region into n-equal portions, with an intersection between the formula (21) and formula (24) being set as a starting point, is represented as ΔC1i (where i represents a natural number of 0 to n), that each of minute sides formed by dividing the periphery C2 of the second region into n-equal portions, with an intersection between the formula (26) and formula (28) serving as a starting point, is represented as ΔC2i and that each of minute regions having a rectangular shape, with ΔC1i and ΔC2i being formed as the two short sides, is defined as ΔSi, the ratio α and the ratio β are surrounded by a circumferential surface S composed of a group of minute regions ΔSi.
• α=−0.005β2+0.0273β−0.0145 (21)
• α=0.0043β2−0.0332β+0.07 (22)
• β=2.875 (23)
• α=−0.0001β2+0.0025β+0.0062 (24)
• α=0.005676 (25)
• α=−0.0103β2+0.047β−0.0322 (26)
• α=0.0093β2−0.0677β+0.1212 (27)
• α=−0.0003β2+0.0036β+0.0046 (28)
• α=0.00498 (29)