Immersion photolithography system and method using microchannel nozzles
AssigneeASML Holding N.V.
InventorsHerman VOGEL, Klaus SIMON, Antonius Theodorus Anna Maria DERKSEN
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Abstract
A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
Claims20
A liquid immersion photolithography system comprising:
- an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate;
- a liquid supply system that provides liquid flow between the projection optical system and the substrate;
- and
- a plurality of micronozzles arranged in two-dimensional array around a periphery of the projection optical system so as to provide the liquid flow between the substrate and the projection optical system.
A liquid immersion photolithography system comprising:
- an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system;
- means for providing a liquid flow between the projection optical system and the exposure area;
- and
- a first microshower having a two-dimensional array of nozzles at one side of the projection optical system that provides the liquid flow in the exposure area.
A liquid immersion photolithography system comprising:
- an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system;
- and
- a two-dimensional array of nozzles around a periphery of a lens of the projection optical system that provide a liquid flow in the exposure area.
Dependencies are inferred from the claim text.