Method for processing a carrier, a carrier, an electronic device and a lithographic mask

A carrier, the carrier comprising,

• a doping profile comprising implanted ions, wherein the doping profile is generated by changing the three-dimensional structure of a mask layer arranged over the carrier so that at least two mask layer regions are formed having different mask layer thicknesses;
• and
• applying an ion implantation process to the at least two mask layer regions to form at least two implanted regions in the carrier having different implantation depth profiles.

A carrier, the carrier comprising,

• implanted material in a first region of the carrier, wherein the implantation depth of the implanted material in the first region of the carrier is continuously substantially linearly changing along a predefined direction parallel to the surface of the carrier.

An electronic device, comprising:

• a carrier comprising:
• implanted material in a first region of the carrier, wherein the implantation depth of the implanted material in the first region of the carrier is continuously substantially linearly changing along a predefined direction parallel to the surface of the carrier.

A lithographic mask, comprising:

• a convolution of a first lithographic mask pattern and a second lithographic mask pattern, wherein:
• the first lithographic mask pattern is designed for exposing a mask layer, to generate a desired patterned mask layer, and
• the second lithographic mask pattern is designed to compensate light intensity variations of an exposure tool.

A lithographic gray scale mask, comprising:

• a gray scale pattern designed for exposing a resist layer, to generate a desired resist layer pattern, wherein the gray scale pattern is adapted to additionally compensate light intensity variations in an exposure field resulting from an exposure tool.

A lithographic exposure arrangement, comprising:

• an exposure tool, the exposure tool configured to generate an exposure field, wherein the exposure field comprises at least two regions having different light intensities,
• a gray scale mask, the gray scale mask comprising:
• a gray scale pattern designed for exposing a resist layer, to generate a desired resist layer pattern, wherein the gray scale pattern comprises at least one region that is adapted to compensate the different light intensities in the at least two regions of the exposure field.