Organic light-emitting display device and method of manufacturing the same

A method of manufacturing an organic light-emitting display device, the method comprising:

• a first mask process for forming on a substrate a gate electrode and a first wiring that extends in a first direction, is connected to the gate electrode, and comprises first and second portions with an opening therebetween;
• a second mask process for forming an active layer corresponding to the gate electrode;
• a third mask process for forming an etch stopper film that comprises holes for exposing edges of the active layer;
• a fourth mask process for forming on the etch stopper film source and drain electrodes that contact the active layer through the holes and a second wiring that extends in a second direction crossing the first direction to overlap the opening;
• a fifth mask process for forming an insulating film that covers the source electrode, the drain electrode, and the second wiring and comprises a first contact hole that exposes the first portion, a second contact hole that exposes the second portion, and a via hole that exposes one of the source electrode and the drain electrode;
• and
• a sixth mask process for forming on the insulating film a pixel electrode that is connected to one of the source electrode and the drain electrode through the via hole and a bridge electrode that electrically connects the first and second portions through the first and second contact holes and comprises a transparent conductive oxide and a metal.

A method of manufacturing an organic light-emitting display device, the method comprising:

• a first mask process for forming on a substrate a gate electrode and a first wiring that is connected to the gate electrode and extends in a first direction;
• a second mask process for forming an active layer corresponding to the gate electrode;
• a third mask process for forming an etch stopper film that comprises holes for exposing edges of the active layer;
• a fourth mask process for forming on the etch stopper film source and drain electrodes that contact the active layer through the holes and for forming on the etch stopper film a second wiring that comprises an opening that overlaps with the first wiring, first and second portions of the second wiring being separated from each other with the opening being interposed therebetween, the second wiring extending in a second direction crossing the first direction;
• a fifth mask process for forming an insulating film that covers the source electrode, the drain electrode, and the second wiring, the insulating film comprising a first contact hole that exposes the first portion, a second contact hole that exposes the second portion, and a via hole that exposes one of the source electrode and the drain electrode;
• and
• a sixth mask process for forming on the insulating film a pixel electrode that is connected to one of the source electrode and the drain electrode through the via hole and for forming a bridge electrode that electrically connects the first and second portions through the first and second contact holes and comprises a transparent conductive oxide and a metal.