Plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsJun YOSHIKAWA, Toshihisa NOZAWA, Naoki MATSUMOTO, Peter L. G. VENTZEK
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Abstract
Disclosed is a plasma processing apparatus including a processing container that defines a processing space, a mounting table, and a microwave introducing antenna. The mounting table includes a mounting region where a workpiece accommodated in the processing container is mounted. The microwave introducing antenna includes a dielectric window installed above the mounting table. The dielectric window includes a bottom surface region that adjoins the processing space. The bottom surface region is configured in an annular shape so as to limit a region where a surface wave is propagated to a region above an edge of the mounting region.
Claims4
A plasma processing apparatus that generates plasma of a processing gas to process a workpiece, the plasma processing apparatus comprising:
- a processing container configured to define a processing space;
- a mounting table including a mounting region where a workpiece accommodated in the processing container is mounted;
- and
- a microwave introducing antenna,
- wherein the microwave introducing antenna includes a dielectric window installed above the mounting table, and
- the dielectric window includes a bottom surface region that adjoins the processing space, the bottom surface region being formed in an annular shape to limit a region where a surface wave is propagated to a region above an edge of the mounting region.
Dependencies are inferred from the claim text.