US 2014/0231013 A1Published application

Substrate processing apparatus

AssigneeDainippon Screen Mfg. Co., Ltd.

InventorsTAIKI HINODE, TAKASHI OTA, NAOKI FUJIWARA

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Abstract

A substrate processing apparatus includes a phosphoric acid supply device for supplying phosphoric acid aqueous solution onto the upper surface of a substrate held on a spin chuck, a heater for emitting heat toward a portion of the upper surface of the substrate with the phosphoric acid aqueous solution being held on the substrate, a heater moving device for moving the heater to move a position heated by the heater within the upper surface of the substrate, a water nozzle for discharging water therethrough toward a portion of the upper surface of the substrate with the phosphoric acid aqueous solution being held on the substrate and a water nozzle moving device for moving the water nozzle to move the water landing position within the upper surface of the substrate.

Claims5

Dependent claims

A substrate processing apparatus comprising:

a substrate holding device for holding a substrate horizontally;
a phosphoric acid supply device for supplying phosphoric acid aqueous solution onto an upper surface of the substrate held on the substrate holding device to form a liquid film of phosphoric acid aqueous solution covering an entire upper surface of the substrate;
a heater for heating the liquid film of phosphoric acid aqueous solution from an upper surface side of the substrate;
a heater moving device for moving the heater to move a position heated by the heater along the upper surface of the substrate;
a water nozzle for discharging water therethrough toward the liquid film of phosphoric acid aqueous solution to cause the water to land on the liquid film;
and
a water nozzle moving device for moving the water nozzle to move a water landing position along the upper surface of the substrate.

4 more elements

Dependencies are inferred from the claim text.